FOCUS electronics

Home
Products
EFM Background

Instruments for Electron Spectroscopy and Surface Analytics

OMICRON Product Line

UHV Evaporator EFM3, EFM4
UHV Triple Evaporator
EFM3T


In the UHV evaporators EFM 3/4/3T (Evaporator with integral Flux Monitor) the evaporant is either evaporated from a bar, from a rod or from a crucible. This is achieved by electron bombardment heating. The bombarding electron beam induces a temperature rise of the evaporant, causing evaporation.

The crucible-free evaporation is characterised by an ultimate degree of cleanliness with only slight increases of background pressure. From appropriate crucibles (see appendix A) low melting point, low vapour pressure or reactive materials can be evaporated. The instrument is designed for high precision sub-mono-layer up to multi-layer deposition of a wide variety of evaporants including highly refractory materials.

A key feature of the EFM is the integrated flux monitor. Once calibrated the flux monitor replaces the necessity of a quartz thickness monitor by continuously monitoring the evaporation rate. Flux is measured directly, which allows a much more precise rate adjustment and much faster rate control than an indirect, i.e. temperature measurement by a thermocouple.

The beam exit column contains an ion collector which serves as a flux monitor. At a given electron emission current (IEM) and e-beam energy the ion flux measured there is directly proportional to the flux of evaporated atoms. The ion flux is displayed on the left indicator of the electronics unit. The flux monitor also operates with the shutter closed thus allowing to pre-set the evaporation rate.

The EFM comes with a shutter at its outlet which can be opened and closed by a rotary drive. This allows precise flux adjustment prior to exposure, and exact control of the evaporation time. As an option, the shutter can be motor operated under computer remote control together with the power supply EVC300.

The evaporation cell is contained in a water-cooled copper cylinder (cooling shroud). This, and the fact that just a restricted region of the evaporant is heated facilitates to keep the background pressure during evaporation below 10-10 mbar. But this also depends on the target material and on the pumping speed of the vacuum system. Some evaporants and crucibles contain huge amounts of gas that are deliberated on heating.

            Triple evaporator EFM 3T

The triple evaporator EFM 3T features three completely separated evaporation cells on one CF 35 flange each one similar to a single EFM 3. Each cell has an independent electron bombardment heater. It can be used for simultaneous or subsequent evaporation of up to three different materials and is therefore ideally suited to grow binary and tertiary compounds or multilayers.

The evaporation shows no material crosstalk between the three cells. Each cell has its integral flux monitor so that the flux can be measured independently and pre-set before opening the shutter. With the shutter mechanism each cell can be opened separately as well as various combinations of the cells.


            Specifications EFM3/4

beam spot diameter at the sample

EFM 3 : 4 to 15 mm,

EFM 4 : 6 to 40, depending on distance and exit

beam divergence:

EFM 3 : ± 2°, ± 2.2° or ± 2.4°, dependent on exit tube mounted.
With the EFM 3 come three exchangeable exit tubes of 4, 6 and 7.4 mm I.D.

EFM 4 : ± 2.2°, ± 3.6°, ± 5.1° or ± 6.9°, depending on exit aperture.
With the EFM 4 come four exchangeable exit apertures of 6, 10, 14 and 19 mm I.D..

distance flange to sample

220 - 270 mm (other length on request)

distance tip of evaporant to sample:

100-150 mm typically

distance end of EFM to the sample:

10-60 mm

e-beam energy:

about 0-1000 eV, (600-800 eV typically),
I
max= 300 mA, Pmax= 300 W with EVC300

maximum bakeout temperature :

250°C

maximum crucible load:

see list in the appendix E1

cooling water flow:

> 0.5 l/min at T about 30 °C, maximum pressure = 6 bar

temperature range with
rod evaporation:

300° up to 3300°C, depends on size of evaporant (heat loss)

temperature range with Ta- or Mo-crucible:


300° - 2000°C

temperature range with Knudsen crucible (stainless steel):


160°C - 800° C

rod diameter:

0.5 -3 mm, depending on maximum temperature to be reached, standard Mo clamp accepts 0.5 to 1.5 mm diameter.

Filament current:

typically 1.8 - 2.2 A, 2.5 A maximum

Weight of evaporator:

2.2 kg


            Specifications EFM 3T

flange to sample distance:

10’’ = 254mm

beam spot diameter at the sample

15mm with 5mm I.D. exit aperture

11mm with 4mm I.D. exit aperture

8.5mm with 3mm I.D. exit aperture

beam divergence:

± 2°, ± 2.2° or ± 2.4°, dependent on exit apertures mounted. With the EFM 3T come three exchangeable exit apertures of 3,4 and 5 mm I.D..

selectable evaporation cells

all combinations except simultaneous evaporation out of cell 2 and cell 3 (see fig.2.7)

distance from the end of EFM to the sample:

94mm

e-beam energy:

about 0-1000 eV, (600 - 800 eV typically),

Imax= 105 mA, Pges £ 300 W

maximum bakeout temperature :

250°C

maximum crucible load:

see list in the appendix E1

maximum crucible diameter

8mm o.d.

cooling water flow:

= 0.5 l/min at T about 30 °C, maximum pressure = 6 bar

temperature range with
rod evaporation:

300° up to 3300°C, depends on size of evaporant (heat loss)

temperature range with Ta- or Mo-crucible:


300° - 2000°C

temperature range with
Knudsen crucible (stainless steel):


160°C - 800° C

rod diameter:

0.5 -3 mm, depending on maximum temperature to be reached, standard Mo clamp accepts 0.5 to 1.5 mm diameter.

IFIL:

typically 2.0 - 2.4 A, 2.7 A maximum

Weight of evaporator:

2.5 kg

 


This product is part of the OMICRON Product Line



Requests and comments concerning this website. Copyright © 2002 FOCUS GmbH,  last updated 2002-10-21. Best viewed with MS Internet Explorer